{
  "docId": "019dd923-622c-750b-8b9a-3e539d2729fa",
  "docSlug": "a8e4eb348e06",
  "documentTitle": "Lasertec Corporation (6920)",
  "authorId": "58_Scorpion_Capital",
  "authorName": "Scorpion Capital",
  "documentKindSlug": "research-note",
  "documentKindLabel": "Research note",
  "sourceTypeSlug": "short_seller",
  "sourceTypeLabel": "Short seller",
  "presentationDate": "2024-06-05 00:00:00",
  "orientation": "landscape",
  "aspectRatio": 1.3333334,
  "pageNumber": 52,
  "pageCount": 56,
  "prevPage": 51,
  "nextPage": 53,
  "slideType": "key_takeaways",
  "function": "summarize",
  "density": "dense",
  "nDataPoints": 0,
  "notes": "The slide uses expert testimony and industry intelligence to build a bearish case against Lasertec's product viability.",
  "elementsJson": [
    "headline_text",
    "bullet_list"
  ],
  "metadataConfidence": 1,
  "imagePath": null,
  "slideHref": "/slides/019dd923-622c-750b-8b9a-3e539d2729fa/52",
  "deckHref": "/decks/019dd923-622c-750b-8b9a-3e539d2729fa",
  "deckJsonHref": "/decks/019dd923-622c-750b-8b9a-3e539d2729fa.json",
  "deckAnchorHref": "/decks/019dd923-622c-750b-8b9a-3e539d2729fa#slide-52",
  "components": [
    {
      "bbox": null,
      "kind": "callout",
      "text": "Lasertec's market window for actinic EUV mask inspection is rapidly closing, as the next phase in EUV is High NA lithography.",
      "attrs": null,
      "subkind": null,
      "toolName": "Visual emphasis",
      "toolSlug": "visual-emphasis",
      "confidence": null,
      "componentId": "019dd953-25b2-736e-8e5f-147aab654b64",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.2,
        "w": 0.85,
        "x": 0.07,
        "y": 0.7
      },
      "kind": "list",
      "text": "A leading EUV lithography expert who interacts closely with all key players - Lasertec, Intel, KLA, and others - told us that all three of Lasertec's key customers have quietly built their own EUV mask inspection systems.",
      "attrs": null,
      "subkind": "bullet",
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "12d077df-2e23-47ef-a04c-4b755dfd7ab8",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.2,
        "w": 0.85,
        "x": 0.07,
        "y": 0.2
      },
      "kind": "list",
      "text": "TSMC, Intel, and Samsung's use of DUV, electron beam, and HHG systems indicates that Lasertec's market window for actinic EUV mask inspection is rapidly closing, as the next phase in EUV is High NA lithography.",
      "attrs": null,
      "subkind": "bullet",
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "28d0a628-0d42-4800-a678-2668e038c935",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.2,
        "w": 0.85,
        "x": 0.07,
        "y": 0.45
      },
      "kind": "list",
      "text": "We note his comments that KLA is working on an electron beam solution, consistent with KLA's comments that it is timing its actinic EUV product to \"intersect\" with High NA.",
      "attrs": null,
      "subkind": "bullet",
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "8907d6ea-05cf-489a-b1e0-d6dcfa9336fe",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": null,
      "kind": "quote",
      "text": "actinic is not going to be sufficient for mask inspection because sub-resolution assist features will become necessary...those features you cannot detect with actinic light...ultimately an electron beam solution is required...they need features on a mask that are smaller than 13.5nm...higher resolution than EUV is required...and people are working on an electron beam solution...KLA is one of them. — Japanese semiconductor executive friendly with Lasertec's CEO",
      "attrs": null,
      "subkind": null,
      "toolName": "Authority citation",
      "toolSlug": "authority-citation",
      "confidence": null,
      "componentId": "019dd953-25b2-736e-8e5f-19023f6a9a05",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.06,
        "w": 0.85,
        "x": 0.07,
        "y": 0.12
      },
      "kind": "title",
      "text": "10. Lasertec’s actinic EUV tool is so defective and unreliable that TSMC, Intel, and Samsung have all quietly substituted non-EUV alternatives for inspecting EUV masks (cont’d)",
      "attrs": null,
      "subkind": "action-title",
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "8cdca32a-0e80-4ca5-872f-770e426f8ee6",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.03,
        "w": 0.4,
        "x": 0.07,
        "y": 0.07
      },
      "kind": "title",
      "text": "Detailed summary / key findings",
      "attrs": null,
      "subkind": "headline",
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "1524bd62-de4f-4273-bb2b-c12eec27f06f",
      "frameworkName": null,
      "frameworkSlug": null
    }
  ],
  "metrics": [],
  "tools": [
    {
      "name": "Call to action",
      "slug": "call-to-action",
      "agent": null,
      "layer": "slide",
      "matchId": "d4ec1bd2-3a8d-439b-8907-61dbaab134ea",
      "evidence": "callout: Lasertec's market window for actinic EUV mask inspection is rapidly closing, as the next phase in EUV is High NA lithography.",
      "confidence": 0.7
    },
    {
      "name": "Storytelling: audience calibration",
      "slug": "audience",
      "agent": "storyteller",
      "layer": "slide",
      "matchId": "4c637614-3484-4610-a32a-14b798e5530c",
      "evidence": "A leading EUV lithography expert who interacts closely with all key players - Lasertec, Intel, KLA, and others - told us that all three of Lasertec's key customers have quietly built their own EUV mask inspection systems as a workaround given its defective tool.",
      "confidence": 0.7
    }
  ],
  "frameworks": [
    {
      "name": "evidence-matrix",
      "slug": null,
      "matchId": "b5dbbe83-380e-452f-bb24-57ddb2eb11b0",
      "evidence": "The slide synthesizes multiple expert quotes and industry observations to support a specific thesis.",
      "confidence": 0.8
    }
  ],
  "arcBeats": [
    {
      "to": 56,
      "from": 31,
      "beatId": "3f095ed5-de2f-4a64-bb32-5a79c5566416",
      "arcName": "Overcoming the Monster",
      "arcSlug": "overcoming-monster",
      "beatName": "The Victory",
      "beatSlug": "overcoming-monster-the-victory",
      "evidence": "Conclusion and summary of Lasertec's dire situation",
      "position": 2,
      "confidence": 0.8,
      "parentBeatName": "Turn",
      "parentBeatSlug": "turn"
    }
  ],
  "loops": [],
  "imagePathAlt": null,
  "thumbSrc": null,
  "thumbSrcAlt": null,
  "locked": true
}