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  "documentTitle": "Lasertec Corporation (6920)",
  "authorId": "58_Scorpion_Capital",
  "authorName": "Scorpion Capital",
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  "presentationDate": "2024-06-05 00:00:00",
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  "notes": "The slide uses a technical diagram and a 3D render to explain the reflective nature of EUV masks.",
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      "kind": "callout",
      "text": "極端紫外線マスクは深紫外線マスクと違って光を透過させるのでなく、反射する",
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      "text": "Diagram showing the path of light in an EUV system using mirrors and a reflective mask.",
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      "text": "3D render of an ASML EUV lithography machine optical column.",
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      "text": "極端紫外線露光装置の光学系は、深紫外線露光装置のそれとは根本的に違う。なぜならば、極端紫外線はガラスや空気を透過できないため、紫外線用のレンズでなく、真空室の中に設置された一連の鏡を使って誘導する。また、極端紫外線マスクも光を透過させるのでなく、反射させる。",
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      "text": "出典: https://www.asml.com/en/products/euv-lithography-systems; https://semiconductor.samsung.com/news-events/tech-blog/a-nano-scale-sketch-on-a-millimeter-scale-wafer-part-2/.",
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      "arcName": "Overcoming the Monster",
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