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  "documentTitle": "Lasertec Corporation (6920)",
  "authorId": "58_Scorpion_Capital",
  "authorName": "Scorpion Capital",
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  "sourceTypeLabel": "Short seller",
  "presentationDate": "2024-06-05 00:00:00",
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  "pageNumber": 32,
  "pageCount": 334,
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  "notes": "The slide explains the technical foundation of the company's core business by detailing the photolithography process.",
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      "text": "Diagram of photolithography process showing light source, mask, lens, and wafer.",
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      "kind": "paragraph",
      "text": "極端紫外線とは何か、また、レーザーテックの主力製品とは何か。これを理解するために、まずは記憶装置や演算装置などの半導体装置の作り方を知る必要がある。撮影とは、カメラの中の写真フィルムが露光され、被写体の画像がフイルムに描画されることだ。半導体装置製造ではそれに類似する過程で、「露光装置」によりフォトレジストという感光性の材料でコーティングされたシリコンウェハに、回路の画像を転写する。転写するためには、回路が描画されたフォトマスク（略して「マスク」とも呼ぶ）を通してウェハに光を当てる。光が当たったところはその後のー連の工程を経て電気回路になる。以前はフォトマスクに描画された回路の画像が1:1の倍率でウェハーに転写されたが、回路の微細化の進展に伴って、画像を縮小して投影する露光装置が実用化された。その装置で使われるフォトマスクを「レチクル」と呼ぶことがあるが、半導体業界ではそのまま「フォトマスク」と呼ぶことも多い。",
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      "text": "出典：https://semiconductor.samsung.com/us/support/tools-resources/fabrication-process/eight-essential-semiconductor-fabrication-processes-part-4-photolithography-laying-the-blueprint/",
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      "text": "半導体露光技術",
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      "arcName": "Overcoming the Monster",
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