{
  "docId": "019dd923-622c-750b-8b9a-26b63f68bb16",
  "docSlug": "9abaa7a9bbfc",
  "documentTitle": "Lasertec Corporation (6920)",
  "authorId": "58_Scorpion_Capital",
  "authorName": "Scorpion Capital",
  "documentKindSlug": "activist-deck",
  "documentKindLabel": "Activist deck",
  "sourceTypeSlug": "short_seller",
  "sourceTypeLabel": "Short seller",
  "presentationDate": "2024-06-05 00:00:00",
  "orientation": "landscape",
  "aspectRatio": 1.3333334,
  "pageNumber": 199,
  "pageCount": 334,
  "prevPage": 198,
  "nextPage": 200,
  "slideType": "expose_contradiction",
  "function": "expose_contradiction",
  "density": "overcrowded",
  "nDataPoints": 0,
  "notes": "The slide uses red underlining to emphasize specific technical failures (ion damage, plasma instability) within the English source text, with Japanese annotations explaining the implications.",
  "elementsJson": [
    "paragraph",
    "screenshot"
  ],
  "metadataConfidence": 0.95,
  "imagePath": null,
  "slideHref": "/slides/019dd923-622c-750b-8b9a-26b63f68bb16/199",
  "deckHref": "/decks/019dd923-622c-750b-8b9a-26b63f68bb16",
  "deckJsonHref": "/decks/019dd923-622c-750b-8b9a-26b63f68bb16.json",
  "deckAnchorHref": "/decks/019dd923-622c-750b-8b9a-26b63f68bb16#slide-199",
  "components": [
    {
      "bbox": null,
      "kind": "callout",
      "text": "If the discharge condition is not optimized, the plasma becomes unstable and brightness stability becomes worse. Brightness may drop below the threshold required for mask inspection.",
      "attrs": null,
      "subkind": null,
      "toolName": "Visual emphasis",
      "toolSlug": "visual-emphasis",
      "confidence": null,
      "componentId": "019dd953-203d-768d-bb11-76b52850bf3b",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.09,
        "w": 0.48,
        "x": 0.07,
        "y": 0.21
      },
      "kind": "image",
      "text": "26 May 2023 Improvement of LDP EUV source performance for actinic patterned mask inspection",
      "attrs": null,
      "subkind": "screenshot",
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "89bc5630-f23f-499d-9c1e-ed77ca2a941b",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.05,
        "w": 0.45,
        "x": 0.07,
        "y": 0.41
      },
      "kind": "legend",
      "text": "プラズマから発生する高速イオンが飛沫としてコレクターの表面に当り、被害をもたらす。このイオンによる被害はコレクターの寿命を縮める。",
      "attrs": null,
      "subkind": null,
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "612f4ff5-85b6-423c-a894-019d51a78233",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.02,
        "w": 0.07,
        "x": 0.39,
        "y": 0.67
      },
      "kind": "legend",
      "text": "暗い瞬発",
      "attrs": null,
      "subkind": null,
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "b81ec15e-5f12-410a-9a7a-145935846b65",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.02,
        "w": 0.15,
        "x": 0.43,
        "y": 0.32
      },
      "kind": "legend",
      "text": "イオンによる光学系の被害",
      "attrs": null,
      "subkind": null,
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "bd66da87-bb23-4f61-85da-b76ba0bf5bab",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.05,
        "w": 0.45,
        "x": 0.39,
        "y": 0.52
      },
      "kind": "legend",
      "text": "プラズマが不安定になり、輝度が変動する……輝度がマスク検査可能な限界値を下回ることがある",
      "attrs": null,
      "subkind": null,
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "fd1b56dc-7185-479d-acb9-0b1ece6f8c45",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.03,
        "w": 0.65,
        "x": 0.07,
        "y": 0.14
      },
      "kind": "paragraph",
      "text": "露光工学会の2023年の2回の会議におけるインテルとレーザーテックの共同プレゼンテーション（抜粋）",
      "attrs": null,
      "subkind": "paragraph",
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "5f51145f-f81e-4196-a518-35f9b630ce88",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.45,
        "w": 0.86,
        "x": 0.07,
        "y": 0.33
      },
      "kind": "paragraph",
      "text": "of the electrode design as well as other changes. Ion induced damage to the optical components such as downstream mirrors was mitigated by development of an effective debris mitigation approach. These improvements have Fast moving ions originating from the plasma hit the collector surface and induce damage by sputtering. This ion induced damage limits the collector lifetime. It is necessary to reduce the velocity of the ions to minimize ion induced damage. Argon gas at high flow rate is injected in the path of the ions. The argon atoms collide with the fast-moving ions If the discharge condition is not optimized, the plasma becomes unstable and brightness stability becomes worse. Brightness may drop below the threshold required for mask inspection. We term such EUV pulses that has intensity or brightness below the minimum threshold as dark pulses. Reducing and minimizing the number of dark pulses is crucial for quality and throughput of the inspection. Figure 8 shows the trend of the dark pulse count over time. Significant",
      "attrs": null,
      "subkind": "paragraph",
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "8383390c-804a-4091-a2d9-7e7f460962b1",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": null,
      "kind": "quote",
      "text": "This ion induced damage limits the collector lifetime. It is necessary to reduce the velocity of the ions to minimize ion induced damage. Argon gas at high flow rate is injected in the path of the ions. The argon atoms collide with the fast-moving ions",
      "attrs": null,
      "subkind": null,
      "toolName": "Authority citation",
      "toolSlug": "authority-citation",
      "confidence": null,
      "componentId": "019dd953-203d-768d-bb11-795c6735a1c2",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.05,
        "w": 0.78,
        "x": 0.07,
        "y": 0.91
      },
      "kind": "source-note",
      "text": "出典：https://www.spiedigitallibrary.org/conference-proceedings-of-spie/PC12494/PC124940E/Improvement-of-LDP-EUV-source-performance-for-actinic-patterned-mask/10.1117/12.2671128.full",
      "attrs": {
        "numbered": true
      },
      "subkind": null,
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "fca19537-55d6-4587-af33-4c0d2774d497",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.06,
        "w": 0.86,
        "x": 0.07,
        "y": 0.07
      },
      "kind": "title",
      "text": "インテルの露光工学会論文では、レーザーテック製の極端紫外線装置で発生する一連の問題を確認できる",
      "attrs": null,
      "subkind": "headline",
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "41c2ae79-a29e-4d37-a448-67b7cf4febc9",
      "frameworkName": null,
      "frameworkSlug": null
    }
  ],
  "metrics": [],
  "tools": [],
  "frameworks": [],
  "arcBeats": [],
  "loops": [],
  "imagePathAlt": null,
  "thumbSrc": null,
  "thumbSrcAlt": null,
  "locked": true
}