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  "documentTitle": "Lasertec Corporation (6920)",
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  "notes": "The slide highlights a discrepancy between Lasertec's marketing claims and the technical depth of their published research.",
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      "text": "レーザーテックの論文は、内容は概念の列記に留まっており、文体は「ビジョン」を描く未来形を使っている。これとは対照的に、この論文を発表してからまもなく発行されたACTIS A300の製品発表では、高開口数対応を既成のものとして現在形で述べている。",
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      "text": "Red annotations highlight the lack of technical specificity and the use of future-tense 'vision' language.",
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      "text": "Lasertec's paper published shortly before the ACTIS A300 launch lacks technical depth, specifically regarding the optical system, compared to ASML's disclosures.",
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      "text": "One of the important aspects of the current ACTIS design is that it uses projection optics with asymmetric NA and resolution in the X and Y directions... the next-generation ACTIS will follow the same design concept but with a higher NA...",
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      "text": "One of the important aspects of the current ACTIS design is that it uses projection optics with asymmetric NA and resolution in the X and Y directions to maximize sensitivity and resolution. This feature is highly compatible with the inspection of anamorphic patterns, which have different sensitivity requirements in the X and Y directions. As shown in Figure 2, the next-generation ACTIS will follow the same design concept but with a higher NA, mainly to meet the high sensitivity requirements in the X direction for anamorphic patterns. This will provide optimal inspection for anamorphic patterns while allowing for further pattern width reduction in future technology nodes. — Lasertec Corporation technical paper",
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      "text": "Source: Expert interviews by Scorpion Capital; Reuters article 2023-12-21",
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      "text": "Actinic Patterned Mask Inspection for High-NA EUV Lithography",
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