{
  "docId": "019dd923-622c-750b-8b9a-26b63f68bb16",
  "docSlug": "9abaa7a9bbfc",
  "documentTitle": "Lasertec Corporation (6920)",
  "authorId": "58_Scorpion_Capital",
  "authorName": "Scorpion Capital",
  "documentKindSlug": "activist-deck",
  "documentKindLabel": "Activist deck",
  "sourceTypeSlug": "short_seller",
  "sourceTypeLabel": "Short seller",
  "presentationDate": "2024-06-05 00:00:00",
  "orientation": "landscape",
  "aspectRatio": 1.3333334,
  "pageNumber": 109,
  "pageCount": 334,
  "prevPage": 108,
  "nextPage": 110,
  "slideType": "expose_contradiction",
  "function": "expose_contradiction",
  "density": "overcrowded",
  "nDataPoints": 5,
  "notes": "The slide uses KLA's own presentation to point out the technical challenge of contamination from tin-based plasma sources.",
  "elementsJson": [
    "headline_text",
    "bullet_list",
    "callout_box",
    "screenshot",
    "photo",
    "footnote"
  ],
  "metadataConfidence": 0.95,
  "imagePath": null,
  "slideHref": "/slides/019dd923-622c-750b-8b9a-26b63f68bb16/109",
  "deckHref": "/decks/019dd923-622c-750b-8b9a-26b63f68bb16",
  "deckJsonHref": "/decks/019dd923-622c-750b-8b9a-26b63f68bb16.json",
  "deckAnchorHref": "/decks/019dd923-622c-750b-8b9a-26b63f68bb16#slide-109",
  "components": [
    {
      "bbox": null,
      "kind": "callout",
      "text": "Plasma based sources are the dirtiest parts in EUV tools. In inspectors, the problem of isolating the mask from source debris is more severe than in scanners.",
      "attrs": null,
      "subkind": null,
      "toolName": "Visual emphasis",
      "toolSlug": "visual-emphasis",
      "confidence": null,
      "componentId": "019dd953-203d-768d-bb09-e401845b89cc",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.15,
        "w": 0.15,
        "x": 0.75,
        "y": 0.47
      },
      "kind": "image",
      "text": null,
      "attrs": null,
      "subkind": "illustration",
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "f4e9d70d-ed64-4389-a53a-15a727157abc",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.12,
        "w": 0.45,
        "x": 0.35,
        "y": 0.46
      },
      "kind": "list",
      "text": "Scanner best values: 1 adder per 10k wafers, 140 wafers/hr => ~70 hours (status 2016: 120 adders). Assuming 5 hrs per mask inspection, it corresponds to at least 1 adder per ~15 inspections!",
      "attrs": null,
      "subkind": "bullet",
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "08a2094d-536a-4f55-9e47-b80a3247c5cc",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.08,
        "w": 0.45,
        "x": 0.35,
        "y": 0.59
      },
      "kind": "list",
      "text": "Based on scanner research, tin may reach the mask due to secondary effects of bounced/released micro-particles, liquid tin splashing, and accumulation (and sputtering) of deposited tin at the walls.",
      "attrs": null,
      "subkind": "bullet",
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "64496ed2-5211-45ae-ba6f-9112ea35b489",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.08,
        "w": 0.45,
        "x": 0.35,
        "y": 0.28
      },
      "kind": "list",
      "text": "EUV mask inspection, specifically final one at mask shop, must find defects but not contaminate! These inspectors are the cleanest machines among all tools used in a fab / mask shop. Example Teron 640e: less than 0.1 PRP.",
      "attrs": null,
      "subkind": "bullet",
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "785a7a23-2969-4f1c-ab02-b2cfcc5f6bb2",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.08,
        "w": 0.45,
        "x": 0.35,
        "y": 0.37
      },
      "kind": "list",
      "text": "Plasma based sources are the dirtiest parts in EUV tools. In inspectors, the problem of isolating the mask from source debris is more severe than in scanners.",
      "attrs": null,
      "subkind": "bullet",
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "c816daac-3aeb-4d37-8809-43f02e2fcbab",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": null,
      "kind": "quote",
      "text": "「欠陥を発見するが、汚染を発生させないこと」 — KLA",
      "attrs": null,
      "subkind": null,
      "toolName": "Authority citation",
      "toolSlug": "authority-citation",
      "confidence": null,
      "componentId": "019dd953-203d-768d-bb09-e9c4ecb840c0",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.05,
        "w": 0.2,
        "x": 0.75,
        "y": 0.62
      },
      "kind": "source-note",
      "text": "K. Gielissen, \"The nature and characteristics of particles produced by EUV sources: exploration, prevention and mitigation\", PhD thesis TU Eindhoven, 2009",
      "attrs": null,
      "subkind": null,
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "ae138e9a-b887-46aa-b7a7-2321790f3e61",
      "frameworkName": null,
      "frameworkSlug": null
    },
    {
      "bbox": {
        "h": 0.03,
        "w": 0.35,
        "x": 0.35,
        "y": 0.24
      },
      "kind": "title",
      "text": "System and source cleanliness requirements",
      "attrs": null,
      "subkind": "headline",
      "toolName": null,
      "toolSlug": null,
      "confidence": null,
      "componentId": "7c3b2207-3a3d-4ac5-80e5-93d02fecb2a8",
      "frameworkName": null,
      "frameworkSlug": null
    }
  ],
  "metrics": [],
  "tools": [],
  "frameworks": [
    {
      "name": "ceo-quote-contradiction",
      "slug": null,
      "matchId": "475e4f4b-41a8-4495-925e-970d3f0836b1",
      "evidence": "Contrasts the stated goal of cleanliness with the reality of plasma source contamination.",
      "confidence": 0.85
    }
  ],
  "arcBeats": [],
  "loops": [],
  "imagePathAlt": null,
  "thumbSrc": null,
  "thumbSrcAlt": null,
  "locked": true
}