{ "docId": "019dd923-622c-750b-8b9a-26b63f68bb16", "docSlug": "9abaa7a9bbfc", "documentTitle": "Lasertec Corporation (6920)", "authorId": "58_Scorpion_Capital", "authorName": "Scorpion Capital", "documentKindSlug": "activist-deck", "documentKindLabel": "Activist deck", "sourceTypeSlug": "short_seller", "sourceTypeLabel": "Short seller", "presentationDate": "2024-06-05 00:00:00", "orientation": "landscape", "aspectRatio": 1.3333334, "pageNumber": 107, "pageCount": 334, "prevPage": 106, "nextPage": 108, "slideType": "cite_precedent", "function": "cite_precedent", "density": "dense", "nDataPoints": 0, "notes": "The slide uses a bilingual (Japanese/English) format to present technical evidence regarding tin debris damage mechanisms.", "elementsJson": [ "paragraph", "screenshot", "bullet_list" ], "metadataConfidence": 1, "imagePath": null, "slideHref": "/slides/019dd923-622c-750b-8b9a-26b63f68bb16/107", "deckHref": "/decks/019dd923-622c-750b-8b9a-26b63f68bb16", "deckJsonHref": "/decks/019dd923-622c-750b-8b9a-26b63f68bb16.json", "deckAnchorHref": "/decks/019dd923-622c-750b-8b9a-26b63f68bb16#slide-107", "components": [ { "bbox": null, "kind": "callout", "text": "An unwanted by-product is deposition of Sn debris on the collector optic, which focuses the EUV light emitting from the plasma. Consequently, collector reflectivity is degraded.", "attrs": null, "subkind": null, "toolName": "Visual emphasis", "toolSlug": "visual-emphasis", "confidence": null, "componentId": "019dd953-203d-768d-bb09-497af78424fa", "frameworkName": null, "frameworkSlug": null }, { "bbox": { "h": 0.6, "w": 0.45, "x": 0.07, "y": 0.22 }, "kind": "list", "text": "2017 paper by plasma physicists and others at U.C. Berkeley, Applied Materials et al; 2022 paper by Chinese scientists; 2019 presentation by German physicists", "attrs": null, "subkind": "bullet", "toolName": null, "toolSlug": null, "confidence": null, "componentId": "60407c9e-8c94-473a-9233-857c5383b580", "frameworkName": null, "frameworkSlug": null }, { "bbox": { "h": 0.15, "w": 0.39, "x": 0.54, "y": 0.6 }, "kind": "list", "text": "Considerable contamination of the collector mirror occurs by tin debris; Chip manufacturing needs increased source availability and productivity; Increase of collector lifetime needed; Internal tin-cleaning by plasma etching is too slow for thick deposits", "attrs": null, "subkind": "bullet", "toolName": null, "toolSlug": null, "confidence": null, "componentId": "9d72537b-ca79-45a0-b13e-2c52b433c703", "frameworkName": null, "frameworkSlug": null }, { "bbox": { "h": 0.15, "w": 0.86, "x": 0.07, "y": 0.06 }, "kind": "paragraph", "text": "レーザーテック製の極端紫外線光源で起きる錫汚染は多くの論文で指摘・説明されている。代表的な3本の論文の抜粋を下記にて紹介する。1本では錫デブリが「飛沫、注入、付着という3通りの被害をコレクターに被害をもたらすことがある」とあり、そのうち2通りの被害は修復不可能だとしている。もう1本の論文では、デブリを「微小粒子（錫の液滴）、低速原子/イオンのデブリ、高速イオンのデブリ」という3種類に整理して説明している。", "attrs": null, "subkind": "paragraph", "toolName": null, "toolSlug": null, "confidence": null, "componentId": "39a1fb1c-8334-4f07-a390-552142443af9", "frameworkName": null, "frameworkSlug": null }, { "bbox": { "h": 0.15, "w": 0.39, "x": 0.54, "y": 0.18 }, "kind": "paragraph", "text": "Abstract Extreme ultraviolet (EUV) lithography produces 13.5 nm light by irradiating a droplet of molten Sn with a laser... This Sn-based plasma emits Sn ion and neutral debris, which can damage the collector optic...", "attrs": null, "subkind": "paragraph", "toolName": null, "toolSlug": null, "confidence": null, "componentId": "7f9867f7-a04e-41a8-b969-1472670ab501", "frameworkName": null, "frameworkSlug": null }, { "bbox": { "h": 0.15, "w": 0.39, "x": 0.54, "y": 0.38 }, "kind": "paragraph", "text": "occur, caused by large heat load from the discharge plasma. The corroded electrode materials are introduced onto the collector as debris contamination, which reduces the lifetime of the collector mirror...", "attrs": null, "subkind": "paragraph", "toolName": null, "toolSlug": null, "confidence": null, "componentId": "ccc9a383-a926-4953-b654-94fc020406dc", "frameworkName": null, "frameworkSlug": null }, { "bbox": null, "kind": "quote", "text": "This Sn-based plasma emits Sn ion and neutral debris, which can damage the collector optic in three ways: sputtering, implantation, and deposition. The first two damage processes are irreversible and are caused by the high energies (1-10 keV) of the ion debris [8].", "attrs": null, "subkind": null, "toolName": "Authority citation", "toolSlug": "authority-citation", "confidence": null, "componentId": "019dd953-203d-768d-bb09-4ceac6d4486c", "frameworkName": null, "frameworkSlug": null }, { "bbox": { "h": 0.08, "w": 0.5, "x": 0.07, "y": 0.89 }, "kind": "source-note", "text": "出典: https://girolami-group.chemistry.illinois.edu/publications/publications/ Plasma%20Chem.%20Plasma%20Process.%202017,%20doi_10.1007_s11090-017-9852-4.pdf https://www.sciencedirect.com/science/article/pii/S270947232200017X https://www.euvlitho.com/2019/S73.pdf", "attrs": null, "subkind": "source-note", "toolName": null, "toolSlug": null, "confidence": null, "componentId": "49fca2a0-dbbd-4235-9db8-5627f5e983e9", "frameworkName": null, "frameworkSlug": null } ], "metrics": [], "tools": [], "frameworks": [ { "name": "authority-citation", "slug": null, "matchId": "43e4358b-7172-4616-97ee-b107e8f82f8f", "evidence": "Citing academic papers to validate technical claims about product failure.", "confidence": 0.9 } ], "arcBeats": [], "loops": [], "imagePathAlt": null, "thumbSrc": null, "thumbSrcAlt": null, "locked": true }