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  "documentTitle": "Lasertec Corporation (6920)",
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  "authorName": "Scorpion Capital",
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  "presentationDate": "2024-06-05 00:00:00",
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      "text": "It therefore requires a vacuum and uses a series of reflective mirrors, instead of using lenses to focus light.",
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      "text": "EUV mask reflects light vs. DUV light going through",
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      "text": "ASML EUV scanner optical column",
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      "text": "The optics in an EUV scanner are completely different than for DUV, as EUV light is absorbed by glass and air. It therefore requires a vacuum and uses a series of reflective mirrors, instead of using lenses to focus light. In a DUV system, light is projected onto a wafer through a mask and series of lenses, whereas in EUV it bounces off highly complex mirrors. Masks for EUV also work by reflecting light.",
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      "text": "Source: https://www.asml.com/en/products/euv-lithography-systems; https://semiconductor.samsung.com/news-events/tech-blog/a-nano-scale-sketch-on-a-millimeter-scale-wafer-part-2/.",
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