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  "documentTitle": "Lasertec Corporation (6920)",
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  "authorName": "Scorpion Capital",
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  "presentationDate": "2024-06-05 00:00:00",
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  "notes": "The slide uses a 'before-after' or 'contradiction' framing to undermine the credibility of the company's product announcement.",
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      "text": "Paper contains only one vague, short paragraph on the system's optics, the heart of a High NA system",
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      "text": "We are troubled that the paper is conceptual and written in the future tense as only a vision - in contrast to the press release days later that represents the High NA system as here and now.",
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      "text": "Lasertec SPIE paper on ACTIS A300 High NA capabilities, Nov 21, 2023",
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      "text": "Actinic Patterned Mask Inspection for High-NA EUV Lithography... 2.2 High NA projection optics of the next-generation ACTIS A3XX... One of the important aspects of the current ACTIS design is that it uses projection optics with asymmetric NA...",
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      "text": "Three days before announcing its ACTIS A300 system in November 2023, several Lasertec engineers presented a paper at the SPIE photomask and EUV lithography conference... We are troubled that the paper is conceptual and written in the future tense as only a vision - in contrast to the press release days later that represents the High NA system as here and now.",
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      "text": "Source: https://www.spiedigitallibrary.org/conference-proceedings-of-spie/12751/1275102/Actinic-pattern-mask-inspection-for-high-NA-EUV-lithography/10.1117/12.2686350.short?webSyncID=9e6ec7a4-9dab-6a0c-bad0-59329ad883c9&sessionGUID=d902bc99-93ce-d268-bead-49a28531ab0d",
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