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  "documentTitle": "Lasertec Corporation (6920)",
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      "text": "In addition to promoting the “new” and supposedly improved light source in the A300, Lasertec purports that the tool is High NA compatible, which refers to next generation EUV lithography with high numerical aperture (“NA”) to shrink the feature size.",
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      "text": "High NA is similar to regular EUV lithography but with larger optics with a 0.55 NA mirror vs. 0.33 currently, for better resolution and higher printing density, similar to changing the F-stop or aperture on a camera. ASML’s new High NA EUV scanners shrink chip features by 1.7X and triple the transistor density.",
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      "text": "Source: ASML presentation Jan 24, 2024, https://www.asml.com/-/media/asml/files/investors/financial-results/q-results/2023/q4/presentation-q4fy2023-press-conference-153ucf.pdf?rev=3d646c331498406f911c5d8d90d2acd1",
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