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  "documentTitle": "Lasertec Corporation (6920)",
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      "text": "The Sumitomo stage that moves the mask/reticle is highly flawed and produces contamination inside the inspection tool",
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      "text": "Magnetically levitating wafer tables that accelerate faster than a fighter jet? Sensors that measure positioning 20,000 times per second with an accuracy of 60 picometers...",
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      "text": "However, ASML developed a proprietary and unique magnetic levitation system for its stage, while Lasertec was forced to buy an off-the-shelf, defective stage from Sumitomo – the only supplier available.",
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      "text": "The Sumitomo stage that moves the mask/reticle is highly flawed and produces contamination inside the inspection tool... That's the second thing they compromised, in addition to the light source.",
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      "text": "“The second key component is the stage that moves the reticle of the mask in the x and y plane... The only stages that you can use are either magnetic levitation or the Sumitomo stage, which is extremely complex and has a huge problem because of the contamination it produces. Lasertec chose the easiest route because it was available. You cannot buy a magnetic levitation stage - the only one is ASML's and it is proprietary. Lasertec cannot do it. It takes ages to do something like that. It's incredibly difficult. That's the second thing they compromised, in addition to the light source.” — Former KLA executive in a leadership role in their EUV mask inspection group",
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      "text": "Source: Scorpion Capital consultation calls with experts; https://www.asml.com/en/technology/lithography-principles/mechanics-and-mechatronics",
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