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  "documentTitle": "Lasertec Corporation (6920)",
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  "authorName": "Scorpion Capital",
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  "presentationDate": "2024-06-05 00:00:00",
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  "notes": "Uses red circles to highlight the 'mask stage' in both diagrams as the focal point of the critique.",
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      "text": "In addition to a defective light source and optics, the key mechanical component of Lasertec’s actinic mask inspection tool - the mask stage - is also fatally flawed.",
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      "text": "The stage is a critical component of both ASML EUV scanners that write the wafers as well as Lasertec’s mask inspection machine, as it continuously moves and adjusts the wafer and mask into appropriate position in the x, y, and z planes during the writing or inspection process, requiring microscopic precision as EUV wavelength is only 13.5nm, a 10X higher resolution than previous DUV systems.",
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      "text": "Source: https://www.lasertec.co.jp/en/ir/individuals/euv.html; https://semiengineering.com/extending-euv-to-2nm-and-beyond/",
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