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  "documentTitle": "Lasertec Corporation (6920)",
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      "text": "We contrast Lasertec's low ~60% uptime with 96% for ASML's EUV source, according to data they presented at an SPIE lithography and patterning conference in 2023.",
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      "text": "We contrast Lasertec's low ~60% uptime with 96% for ASML's EUV source, according to data they presented at an SPIE lithography and patterning conference in 2023. In addition, ASML's EUV collector lasts for over a year, versus only a couple of weeks for the same critical component in Lasertec's machine.",
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      "text": "EUV light source for high-NA and low-NA lithography — Karl Umstadter, Matthew Graham, Michael Purvis, Alex Schafgans, Jayson Stewart, Peter Mayer, Daniel Brown (ASML SPIE paper, April 2023).",
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      "text": "Source: https://www.spiedigitallibrary.org/conference-proceedings-of-spie/12494/124940Z/EUV-light-source-for-high-NA-and-low-NA-lithography/10.1117/12.2657772.full",
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