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  "documentTitle": "Lasertec Corporation (6920)",
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  "notes": "The slide uses expert testimony to frame Ushio's technology as fundamentally flawed, contrasting this with an implied narrative of secrecy.",
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      "text": "Ushio source “is not stable” and “fluctuates”; Ushio is trying to hide their source problems",
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      "text": "Ushio light source data shows that “the bottom line is there is something wrong”",
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      "text": "A leading EUV lithography expert close to all major players including Lasertec, ASML, and KLA - as well as the industry’s three key customers TSMC, Intel, and Samsung - described Lasertec’s source as an unmitigated disaster.",
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      "text": "We asked Ushio, please to share their experimental data in terms of plasma emissions. They gave us the data, and we had about six to seven different models of Ushio data...the bottom line is there is something wrong.",
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      "text": "I asked Ushio what was wrong with their source, and they wouldn't say. I can tell what it is because what happens in a mask inspection system is that your NA - numerical aperture - is very, very small, which means that you don't need only a very small source or a large source that you need for a scanner. But the problem with that is if your source is not stable, then the intensity of light coming in through it fluctuates. So, you have a stability issue.",
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      "text": "“I asked Ushio what was wrong with their source, and they wouldn't say...if your source is not stable, then the intensity of light coming in through it fluctuates...so you have a stability issue...they gave us the data, and we had about six to seven different models of Ushio data...the bottom line is that there is something wrong.” — Leading EUV lithography expert close to Lasertec’s customers",
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      "text": "Source: Scorpion Capital consultation calls with experts",
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