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  "documentTitle": "Lasertec Corporation (6920)",
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  "authorName": "Scorpion Capital",
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  "presentationDate": "2024-06-05 00:00:00",
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  "notes": "The slide uses direct excerpts from academic literature to establish the technical severity of the contamination issue.",
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      "text": "The tin contamination problem that plagues Lasertec’s EUV light source is detailed in various papers.",
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      "text": "Considerable contamination of the collector mirror occurs by tin debris\nChip manufacturing needs increased source availability and productivity\nIncrease of collector lifetime needed: more than several months, > 400 Gp\nInternal tin-cleaning by plasma etching is too slow for thick deposits",
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      "text": "2019 presentation by German physicists: In-situ Cryogenic Cleaning Techniques for Tin-Contaminated EUV Mirrors",
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      "text": "2017 paper by plasma physicists and others at U.C. Berkeley, Applied Materials et al: Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching",
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      "text": "2022 paper by Chinese scientists: The development of laser-produced plasma EUV light source",
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      "text": "occur, caused by large heat load from the discharge plasma83. The corroded electrode materials are introduced onto the collector as debris contamination, which reduces the lifetime of the collector mirror. In order to of two rotating electrodes was employed39,40,43. Generally, the debris generated by Sn-based DPP sources can be divided into three different types in addition to electrode erosion: the micro-particles or liquid Sn droplets, the slow atomic-ionic debris and the fast ionic debris83. Furthermore, by using",
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      "text": "Abstract Extreme ultraviolet (EUV) lithography produces 13.5 nm light by irradiating a droplet of molten Sn with a laser, creating a dense, hot laser-produced plasma and ionizing the Sn to the + 8 through + 12 states. An unwanted by-product is deposition of Sn debris on the collector optic, which focuses the EUV light emitting from the plasma. Consequently, collector reflectivity is degraded. Reflectivity restoration can be accomplished by This Sn-based plasma emits Sn ion and neutral debris, which can damage the collector optic in three ways: sputtering, implantation, and deposition. The first two damage processes are irreversible and are caused by the high energies (1–10 keV) of the ion debris [8].",
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      "text": "This Sn-based plasma emits Sn ion and neutral debris, which can damage the collector optic in three ways: sputtering, implantation, and deposition. The first two damage processes are irreversible and are caused by the high energies (1–10 keV) of the ion debris [8]. — 2017 paper by plasma physicists and others at U.C. Berkeley, Applied Materials et al",
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      "kind": "source-note",
      "text": "Source: https://girolami-group.chemistry.illinois.edu/publications/publications/Plasma%20Chem.%20Plasma%20Process.%202017.%20doi_10.1007_s11090-017-9852-4.pdf; https://www.sciencedirect.com/science/article/pii/S270947232200017X; https://www.euvlitho.com/2019/S73.pdf",
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      "text": "The tin contamination problem that plagues Lasertec’s EUV light source is detailed in various papers. We quote three representative ones below. One describes three ways that tin debris “can damage the collector optic”: “sputtering, implantation, and deposition” – two of which are “irreversible.” A second further classifies the debris into three different types: “micro-particles or liquid Sn [tin] droplets, the slow atomic-ionic debris, and fast ionic debris.”",
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