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      "text": "The problem mainly afflicts the laser-assisted discharge-produced-plasma (LDP) approach employed by Lasertec, in contrast to ASML’s laser-produced plasma (LPP) where the plasma is better controlled.",
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      "text": "Laser-assisted discharge produced plasma (LDP) EUV source for actinic patterned mask inspection (APMI) ... Abstract ... Improved lithography resolution provided by EUVL simplifies the patterning process...",
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      "text": "Contamination from tin-produced plasma is a well-known and long-standing obstacle in the scientific literature on EUV light source development, as igniting tin is the only way to produce the correct wavelength at the right power. The problem mainly afflicts the laser-assisted discharge-produced-plasma (LDP) approach employed by Lasertec, in contrast to ASML’s laser-produced plasma (LPP) where the plasma is better controlled. In 2021, Ushio and Intel presented an SPIE paper describing the Ushio EUV source technology used inside Lasertec’s machine, describing “several technical challenges and infrastructure gaps that need to be resolved to make EUVL suitable for high volume manufacturing...these gaps relate to...a stable and reliable high power EUV source...”",
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      "text": "“several technical challenges and infrastructure gaps that need to be resolved to make EUVL suitable for high volume manufacturing...these gaps relate to...a stable and reliable high power EUV source...” — March 2021 conference paper jointly authored by Ushio and Intel employees",
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